Large‐Area Self‐Assembled Hexagonal Boron Nitride Nanosheet Films for Ultralow Dark Current Vacuum‐Ultraviolet Photodetectors

材料科学 纳米片 光电探测器 制作 肖特基势垒 紫外线 光电子学 暗电流 接触电阻 纳米技术 二极管 病理 替代医学 医学 图层(电子)
作者
Qifan Zhang,Qiang Li,Ransheng Chen,Mingyin Zhang,Wannian Fang,Jiaxing Li,Mingdi Wang,Feng Yun,Tao Wang,Yue Hao
出处
期刊:Advanced Functional Materials [Wiley]
卷期号:34 (28) 被引量:8
标识
DOI:10.1002/adfm.202315149
摘要

Abstract Hexagonal boron nitride (hBN) is one of the most promising candidates for vacuum‐ultraviolet photodetectors (VUV PDs). However, the efficient and low‐cost fabrication of large‐area hBN‐PDs still encounters challenges. Herein, a cost‐effective route is proposed for fast and scalable fabrication of high‐performance VUV PDs via hBN nanosheet (BNNS) films. BNNSs are peeled from bulk hBN and self‐assembled into large‐area ordered films. In such PDs, junction barriers are present at the contact interfaces of BNNSs and give the PDs a “light‐induced reduction of junction barrier height” working mechanism. The number of junction barriers are qualitatively adjusted by designing the size of BNNSs to optimize the performance of the devices. The performance of ultralow dark current (0.27 pA@80 V), high detectivity (3.42 × 10 11 Jones), and fast response speed (20.97/17.69 ms) for 185 nm VUV light is achieved by a fabricated PD. Analysis based on the Schottky contact model proves that the large photoresponse is mainly attributed to the reduction of the barriers and series resistance on illumination. Meanwhile, a physical model is established to describe the working process of such PDs, of which conductivity is dominated by the junction barriers. Besides, a flexible PD is also fabricated, depicting excellent stability, and robustness.
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