材料科学
干涉测量
薄膜
压力(语言学)
相(物质)
带隙
光电子学
光学
宽禁带半导体
纳米技术
物理
量子力学
语言学
哲学
作者
Horng‐Chih Lin,Hsi-Chao Chen,Yu‐Wei Chang,Kun-Hong Chen,Guanghui Su,Z. R. Hong,T.X. Li
标识
DOI:10.1364/oic.2025.wd.7
摘要
A self-made phase-shift interferometer with the 3% measured error was used to measure the anisotropic stresses of zirconium oxide (ZrO 2 ) film. The minimum principle and shearing stresses at are -82.98 and 26.79 MPa, respectively.
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