材料科学
稀释
肖特基二极管
退火(玻璃)
电压降
光电子学
二极管
碳化硅
电压
下降(电信)
沟槽
电气工程
泄漏(经济)
复合材料
工程类
生态学
图层(电子)
生物
宏观经济学
经济
作者
Rui Liu,Fei Yang,Ling Sang,Xiping Niu,Lixin Tian,Wenting Zhang,Yunlai An,Junmin Wu,Ling Li
标识
DOI:10.1109/peas53589.2021.9628621
摘要
This paper reports characteristics of 1.2kV/20A 4H-SiC Junction Barrier controlled Schottky (JBS) rectifiers manufactured in a 6-inch SiC power device laboratory of State Grid. The backside thinning and laser annealing processes are used in the SiC JBS rectifiers, which adopts a shallow trench structure. Compared with the traditional process, the forward on state voltage drop (@20A) of this diode with thinning and laser annealing processes is reduced from 1.71V to 1.38V at 25 ℃ (Chip area is 3mm*3mm). After using the package of TO247-2L, the voltage drop is reduced from 2.8V to 2.4V at temperature up to 175℃. The leakage current remained below 50μA @1.2kV even up to 175℃.
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