正交晶系
外延
结晶学
材料科学
衍射
相(物质)
电子衍射
物理
凝聚态物理
晶体结构
化学
纳米技术
光学
图层(电子)
量子力学
作者
A. F. Marshall,R. Barton,K. Char,A. Kapitulnik,Byeong‐Yun Oh,R. H. Hammond,S. S. Laderman
出处
期刊:Physical review
日期:1988-06-01
卷期号:37 (16): 9353-9358
被引量:209
标识
DOI:10.1103/physrevb.37.9353
摘要
An ordered defect structure in superconducting Y-Ba-Cu-O thin films has been characterized by both x-ray diffraction and transmission electron microscopy. The defect structure, which is observed growing epitaxially within the grains of normal $\mathrm{Y}{\mathrm{Ba}}_{2}{\mathrm{Cu}}_{3}{\mathrm{O}}_{7\ensuremath{-}x}$ structure, has the diffraction characteristics of a distinct phase whose volume fraction can be correlated with changes in film composition. The diffraction characteristics are consistent with an orthorhombic unit cell ($a\ensuremath{\cong}b=3.86$ \AA{}, $c=27.19$ \AA{}) with space group Ammm. These are the characteristics to be expected from a structure in which extra copper-oxygen layers create fault planes, which are inserted at every unit cell in the parent $\mathrm{Y}{\mathrm{Ba}}_{2}{\mathrm{Cu}}_{3}{\mathrm{O}}_{7\ensuremath{-}x}$ structure. The composition expected for the pure phase is ${\mathrm{Y}}_{2}{\mathrm{Ba}}_{4}{\mathrm{Cu}}_{8}{\mathrm{O}}_{20\ensuremath{-}x}$. Preliminary transport measurements on films containing this extra phase are characterized by lower normal-state resistances and a lower Hall constant.
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