微观结构
材料科学
基质(水族馆)
半导体
纹理(宇宙学)
磁电阻
蒸发
电子束物理气相沉积
薄膜
衍射
电阻率和电导率
凝聚态物理
分析化学(期刊)
结晶学
复合材料
光学
化学
纳米技术
光电子学
磁场
热力学
计算机科学
海洋学
色谱法
量子力学
人工智能
工程类
地质学
物理
电气工程
图像(数学)
作者
Thanh Nhan Bui,Jean‐Pierre Raskin,B. Hackens
摘要
Bi thin films, with a thickness of 100 nm, are deposited by electron-beam evaporation on a freshly cleaved (100) KCl substrate. The substrate temperature during film growth (Tdep) ranges from room temperature up to 170 °C. Films deposited at room temperature exhibit a maze-like microstructure typical of the rhombohedral (110) texture, as confirmed by X-ray diffraction. For Tdep above 80 °C, a different microstructure appears, characterized by concentric triangular shapes corresponding to the trigonal (111) texture. Temperature dependence of the resistivity shows a transition from a semiconductor-like behavior for films deposited at room temperature to a metallic-like behavior for Tdep above 80 °C. From magnetoresistance measurements between room temperature and 1.6 K, we extract the electron and hole mobilities, concentrations, and mean free paths, which allow to draw a complete picture of the transport properties of both types of films.
科研通智能强力驱动
Strongly Powered by AbleSci AI