MgO (1 0 0) as an affordable support for heteroepitaxial growth of high-quality β-Ga2O3 thin films and related highly-sensitive solar-blind UV photodetectors

材料科学 响应度 光电探测器 外延 薄膜 光电子学 脉冲激光沉积 暗电流 基质(水族馆) 紫外线 相(物质) 透射电子显微镜 图层(电子) 纳米技术 化学 海洋学 有机化学 地质学
作者
Pan Huang,Lufeng Chen,Daotian Shi,Qi Liu,Jian Chen,Mingkai Li,Yinmei Lu,Jinming Guo,Yunbin He
出处
期刊:Applied Surface Science [Elsevier]
卷期号:634: 157641-157641 被引量:19
标识
DOI:10.1016/j.apsusc.2023.157641
摘要

Heteroepitaxial growth of high-quality β-Ga2O3 thin films on foreign substrates is of crucial importance for achieving high-performance power-electronic and optoelectronic devices with affordable prices. Herein, we demonstrate realization of heteroepitaxial growth of high-quality β-Ga2O3 films on MgO(1 0 0) via pulsed laser deposition, and achievement of related highly-sensitive solar-blind ultraviolet photodetectors (SBUVPDs). Under optimized oxygen pressure (7 Pa), single-phase, (1 0 0)-oriented, and atomically-smooth β-Ga2O3 films were grown epitaxially on MgO(1 0 0), consisting of unique 8–12 nm-wide columnar nanodomains. Atomically-resolvable aberration-corrected transmission electron microscopy unveiled initial growth of a cubic γ-phase transition layer of ∼ 8 nm thickness, and directly visualized occurrence and preferable location of oxygen vacancies at domain walls in the further grown β-Ga2O3 film. Density-functional-theory simulations rationalized the formation of columnar nanodomains in terms of energetics, and presumably identified the nanodomains interface orientations as (112¯)/(11¯2¯). The heteroepitaxial β-Ga2O3(1 0 0)/MgO(1 0 0) film-based photodetector demonstrates excellent performance, featured with exceedingly-low dark current, remarkably-high light-to-dark current ratio, and ultrahigh responsivity and detectivity (Idark = 0.6 pA, Ilight/Idark = 1.47 × 107, R = 191 A/W, D*=3.08 × 1015 Jones) as well as fast response speed towards 255 nm-UV detection. This work highlights MgO(1 0 0) as a suited yet affordable foreign substrate for heteroepitaxial growth of high-quality β-Ga2O3 films towards further development of high-performance devices such as SBUVPDs.

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