欧姆接触
高电子迁移率晶体管
材料科学
光电子学
失效模式及影响分析
氮化镓
晶体管
逻辑门
电压
电气工程
工程类
纳米技术
复合材料
图层(电子)
作者
Xi Jiang,Tao Jiang,Shijie Zhang,Song Yuan,Zhaoheng Yan,Xiaowu Gong,Jun Wang
标识
DOI:10.1109/ted.2023.3314401
摘要
This article studies the short-circuit (SC) failure modes and mechanism of ohmic-gate GaN high electron mobility transistors (HEMTs) through experimental evaluation and numerical investigation. Two distinct SC failure modes of ohmic-gate GaN HEMT have been identified: gate–source SC failure and rapid thermal runaway failure. The SC capability and failure mode of ohmic-gate GaN HEMT are significantly influenced by both the dc bus voltage and gate injection current. Thermal–mechanical simulation and failure analysis techniques are used to identify two SC failure mechanisms: thermal–mechanical stress-induced structural failure and thermal breakdown of the gate GaN/AlGaN heterostructure. The gate injection current is found to be a crucial factor in improving the SC ruggedness of ohmic-gate GaN HEMT under high bus voltage SC conditions.
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