Influence of Photonics and Plasmonics Effect on Ultrathin Amorphous Silicon Thin Film Solar Cell

Abstract Our recent surge in silicon derived materials has major demand in thin film photovoltaic (PV) modules and enhancing the significant numbers. The rigorous coupled wave analysis method is a simple and fast method also known as developed to determine the light absorption and cell efficiency. The optics of thin film solar cells (amorphous silicon) garnering crucial role in the photovoltaic market. In this work, an ultrathin thin film amorphous silicon solar cell PV performance investigated by periodically textured surfaces at the nanoscale level. This analysis of periodic textured substrate was deriving optimal surface textures. The nanogratings lead to light scattering mechanism with the higher order diffraction angle and enhanced the light absorption of the incidence spectrum. The influence of grating period and height, the collection of the charge carriers increased at various wavelengths from ultraviolet, visible and infrared spectral regions are discussed with the assistance of photonic and plasmonic modes. Finally, nanoscale engineering mechanism the optimized thin film amorphous silicon solar cell yielded the highest current densities (22.6 and 23.8 mA/cm 2 ) in both polarization modes.