MOSFET
可靠性(半导体)
材料科学
宽禁带半导体
光电子学
工程物理
可靠性工程
带隙
碳化硅
电子工程
电气工程
工程类
晶体管
复合材料
物理
电压
功率(物理)
量子力学
作者
Ghulam Akbar,Alessio Di Fatta,Giuseppe Rizzo,Guido Ala,Pietro Romano,Antonino Imburgia
出处
期刊:Physchem
[MDPI AG]
日期:2025-03-03
卷期号:5 (1): 10-10
被引量:4
标识
DOI:10.3390/physchem5010010
摘要
Silicon carbide (SiC) MOSFETs, as a member of the emerging technology of wide-bandgap (WBG) semiconductors, are transforming high-power and high-temperature applications due to their superior electrical and thermal properties. Their potential to outperform traditional silicon-based devices, particularly in terms of efficiency and operational stability, has made them a popular choice for power electronics. However, reliability issues about numerous failure types, including gate-oxide degradation, threshold voltage instability, and body diode degeneration, remain serious challenges. This article critically evaluates the key failure mechanisms that affect SiC MOSFET reliability and their impact on device performance. Furthermore, this paper discusses current advances in SiC technology, including both improvements and continued dependability difficulties. Key areas of future study are suggested, with an emphasis on improved material characterization, thermal management, and creative device architecture to improve SiC MOSFET performance and long-term reliability. The insights presented will help to improve the design and testing processes required for SiC MOSFETs’ widespread use in critical high-power applications.
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