负偏压温度不稳定性
俘获
占空比
绝缘体(电)
接口(物质)
材料科学
物理
电子工程
MOSFET
光电子学
电压
机械
工程类
晶体管
生物
量子力学
最大气泡压力法
气泡
生态学
作者
Souvik Mahapatra,Nilesh Goel,S. Desai,Shashank Gupta,B. Jose,Subhadeep Mukhopadhyay,Kaustubh Joshi,Ankit Jain,Ahmad Ehteshamul Islam,Muhammad Ashraful Alam
标识
DOI:10.1109/ted.2013.2238237
摘要
Different physics-based negative bias temperature instability (NBTI) models as proposed in the literature are reviewed, and the predictive capability of these models is benchmarked against experimental data. Models that focus exclusively on hole trapping in gate-insulator-process-related preexisting traps are found to be inconsistent with direct experimental evidence of interface trap generation. Models that focus exclusively on interface trap generation are incapable of predicting ultrafast measurement data. Models that assume strong correlation between interface trap generation and hole trapping in switching hole traps cannot simultaneously predict long-time dc stress, recovery, and ac stress and cannot estimate gate insulator process impact. Uncorrelated contributions from generation and recovery of interface traps, together with hole trapping and detrapping in preexisting and newly generated bulk insulator traps, are invoked to comprehensively predict dc stress and recovery, ac duty cycle and frequency, and gate insulator process impact of NBTI. The reaction-diffusion model can accurately predict generation and recovery of interface traps for different devices and experimental conditions. Hole trapping/detrapping is modeled using a two-level energy well model.
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