NMOS逻辑
静电放电
与非门
闪光灯(摄影)
材料科学
可靠性(半导体)
电子工程
逻辑门
光电子学
电气工程
工程类
晶体管
电压
光学
物理
量子力学
功率(物理)
作者
Biruo Song,Zhiguo Li,Xin Wang,Xiang Fu,Fei Liu,Lei Jin,Zongliang Huo
出处
期刊:Electronics
[MDPI AG]
日期:2022-03-18
卷期号:11 (6): 944-944
被引量:1
标识
DOI:10.3390/electronics11060944
摘要
Electrostatic discharge (ESD) events are the main factors impacting the reliability of NAND Flash memory. The behavior of human body model (HBM) failure and the corresponding physical mechanism of 3D NAND Flash memory are investigated in this paper. A catastrophic burn-out failure during HBM zapping is first presented. Analysis shows that NMOS fingers’ local heating induced by inhomogeneous substrate resistance Rsub and local heating induced by the drain contact and 3D stacked IC (SIC) structure lead to the failure. Therefore, a new approach is proposed to reduce local heat generation. Finally, by increasing N+ length (NPL) and introducing a novel contact strip, the silicon result shows enhanced ESD robustness.
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