Magnetoresistance and Kondo Effect in Nodal-Line Semimetal VAs2 *

磁电阻 半金属 直线(几何图形) 凝聚态物理 近藤效应 物理 电阻率和电导率 带隙 量子力学 数学 几何学 磁场
作者
Shuijin Chen,Zhefeng Lou,Yuxing Zhou,Qin Chen,Binjie Xu,Chunxiang Wu,Jianhua Du,Jinhu Yang,Hangdong Wang,Minghu Fang
出处
期刊:Chinese Physics Letters [Institute of Physics]
卷期号:38 (1): 017202-017202 被引量:11
标识
DOI:10.1088/0256-307x/38/1/017202
摘要

We performed calculations of the electronic band structure and the Fermi surface as well as measured the longitudinal resistivity $\rho_{xx}(T,H)$, Hall resistivity $\rho_{xy}(T,H)$, and magnetic susceptibility as a function of temperature and various magnetic fields for VAs$_2$ with a monoclinic crystal structure. The band structure calculations show that VAs$_2$ is a nodal-line semimetal when spin-orbit coupling is ignored. The emergence of a minimum at around 11 K in $\rho_{xx}(T)$ measured at $H$ = 0 demonstrates that an additional magnetic impurity (V$^{4+}$, $S$ = 1/2) occurs in VAs$_2$ single crystals, evidenced by both the fitting of $\rho_{xx}(T)$ data and the susceptibility measurements. It was found that a large positive magnetoresistance (MR) reaching 649\% at 10 K and 9 T, its nearly quadratic field dependence, and a field-induced up-turn behavior of $\rho_{xx}(T)$ emerge also in VAs$_2$, although MR is not so large due to the existence of additional scattering compared with other topological nontrival/trival semimetals. The observed properties are attributed to a perfect charge-carrier compensation, which is evidenced by both calculations relying on the Fermi surface and the Hall resistivity measurements. These results indicate that the compounds containing V ($3d^3 4s^2$) element as a platform for studying the influence of magnetic impurities to the topological properties.

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