欧姆接触
肖特基势垒
肖特基二极管
异质结
欧米茄
二极管
击穿电压
光电子学
材料科学
阴极
接触电阻
等效串联电阻
电气工程
物理
纳米技术
电压
量子力学
工程类
图层(电子)
作者
Sangwoo Han,Jianan Song,Mansura Sadek,Alex Molina,Mona A. Ebrish,Suzanne E. Mohney,Travis J. Anderson,Rongming Chu
标识
DOI:10.1109/ted.2021.3111543
摘要
This article reports GaN super-heterojunction Schottky barrier diodes (SHJ-SBDs) with substantially improved performance. Metal-2DEG sidewall n-ohmic contacts were deployed to achieve low contact resistance of $0.75~\Omega ~ \cdot ~mm$ , avoiding the risk of abnormally high contact resistance caused by inaccurate etch depth control. A pGaN notch formed near the cathode successfully eliminated excessive hole conduction caused by the sidewall n-ohmic contact. Isolation was improved by a high-energy Al implantation step. The resulting SHJ-SBD exhibited a breakdown voltage (BV) of ~12.5 kV and a specific resistance of 100.8 $\text{m}\Omega ~ \cdot ~cm^{2}$ .
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