聚酰亚胺
材料科学
粘附
延伸率
薄脆饼
聚合物
铜
半导体
光电子学
复合材料
纳米技术
图层(电子)
冶金
极限抗拉强度
作者
Yu Shoji,Yutaro Koyama,Yuki Masuda,Keika Hashimoto,Kimio Isobe,Ryoji Okuda
标识
DOI:10.2494/photopolymer.29.277
摘要
Recently, progress of semiconductor packaging is drastic and multi-pinned devices such as Fan-out Wafer Level Packages (FOWLPs) attract much attention. For those applications, photosensitive polyimides (PSPIs) are applied as re-distribution layers (RDLs) and they are required to have high level of properties such as adhesion to metal and reliability. We developed novel low-temperature curable positive-tone photosensitive polyimides (posi-PSPIs) with high elongation, strong adhesion to the copper RDLs, and high chemical resistance for establishing the multi RDLs by improving the base-polyimides and incorporating polyimides with cross-linkers and adhesion promoters.
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