Evolution of discharge current in high power impulse magnetron sputtering

High power impulse magnetron sputtering (HiPIMS) is nowadays often discussed topic. Physics of HiPIMS discharge is not completely understand yet. Even very basic characteristics of HiPIMS discharge like time resolved dependence of the cathode voltage and the discharge current are still discussed and interpreted. This research shows different regimes of time evolution of the discharge current depending on applied target voltage. Possible interpretation is presented.