非阻塞I/O
原子层沉积
X射线光电子能谱
材料科学
微晶
薄膜
分析化学(期刊)
锂(药物)
镍
椭圆偏振法
化学工程
纳米技术
化学
冶金
医学
工程类
内分泌学
生物化学
催化作用
色谱法
作者
Yury Koshtyal,Denis Nazarov,Ilya Ezhov,Ilya Mitrofanov,Artem Kim,Aleksander Rymyantsev,Oleksiy Lyutakov,Anatoly Popovich,Maxim Maximov
出处
期刊:Coatings
[MDPI AG]
日期:2019-05-03
卷期号:9 (5): 301-301
被引量:59
标识
DOI:10.3390/coatings9050301
摘要
Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film electrodes for Li-ion batteries. In this work, bis(methylcyclopentadienyl) nickel(II) (Ni(MeCp)2) and bis(cyclopentadienyl) nickel(II) (NiCp2) were used as precursors for NiO ALD. Oxygen plasma was used as a counter-reactant. The films were studied by spectroscopic ellipsometry, scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray reflectometry, and X-ray photoelectron spectroscopy. The results show that the optimal temperature for the deposition for NiCp2 was 200–300 °C, but the optimal Ni(MeCp)2 growth per ALD cycle was 0.011–0.012 nm for both precursors at 250–300 °C. The films deposited using NiCp2 and oxygen plasma at 300 °C using optimal ALD condition consisted mainly of stoichiometric polycrystalline NiO with high density (6.6 g/cm3) and low roughness (0.34 nm). However, the films contain carbon impurities. The NiO films (thickness 28–30 nm) deposited on stainless steel showed a specific capacity above 1300 mAh/g, which is significantly more than the theoretical capacity of bulk NiO (718 mAh/g) because it includes the capacity of the NiO film and the pseudo-capacity of the gel-like solid electrolyte interface film. The presence of pseudo-capacity and its increase during cycling is discussed based on a detailed analysis of cyclic voltammograms and charge–discharge curves (U(C)).
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