沟槽
MOSFET
电气工程
失效机理
功率MOSFET
材料科学
阈值电压
电压
碳化硅
光电子学
电子工程
计算机科学
工程类
晶体管
纳米技术
冶金
图层(电子)
复合材料
作者
Masataka Okawa,Ruito Aiba,Taiga Kanamori,Hiroshi Yano,Noriyuki Iwamuro,Shinsuke Harada
标识
DOI:10.1109/ispsd.2019.8757617
摘要
This paper is focused on the short-circuit capability and analysis of failure mechanism on relatively small DC power supply voltage for state-of-the-art 1.2 kV SiC trench MOSFETs. It is found that the gate-source SiO 2 rapture could be a failure mechanism unique to the SiC MOSFETs. Further, the SiC trench MOSFETs with higher threshold voltage can effectively improve the short-circuit capabilities by reducing the probability of channel normally-on induced by the higher lattice temperature.
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