异质结
材料科学
范德瓦尔斯力
单层
肖特基势垒
光电子学
过渡金属
凝聚态物理
纳米技术
化学
物理
分子
生物化学
有机化学
二极管
催化作用
作者
Hwi Yoon,Sangyoon Lee,Jin Won Seo,Inkyu Sohn,Sukhwan Jun,Sungjae Hong,Seongil Im,Yunyong Nam,Hyungjun Kim,Yujin Lee,Seung-min Chung,Hyungjun Kim
标识
DOI:10.1021/acsami.3c18982
摘要
Two-dimensional transition metal dichalcogenides (2D TMDCs) are considered promising alternatives to Si as channel materials because of the possibility of retaining their superior electronic transport properties even at atomic body thicknesses. However, the realization of high-performance 2D TMDC field-effect transistors remains a challenge owing to Fermi-level pinning (FLP) caused by gap states and the inherent high Schottky barrier height (SBH) within the metal contact and channel layer. This study demonstrates that high-quality van der Waals (vdW) heterojunction-based contacts can be formed by depositing semimetallic TiS2 onto monolayer (ML) MoS2. After confirming the successful formation of a TiS2/ML MoS2 heterojunction, the contact properties of vdW semimetal TiS2 were thoroughly investigated. With clean interfaces of the TiS2/ML MoS2 heterojunctions, atomic-layer-deposited TiS2 can induce gap-state saturation and suppress FLP. Consequently, compared with conventional evaporated metal electrodes, the TiS2/ML MoS2 heterojunctions exhibit a lower SBH of 8.54 meV and better contact properties. This, in turn, substantially improves the overall performance of the device, including its on-current, subthreshold swing, and threshold voltage. Furthermore, we believe that our proposed strategy for vdW-based contact formation will contribute to the development of 2D materials used in next-generation electronics.
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