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Molecular dynamics simulation study on the friction performance of WS2 coated copper during the scratching process

材料科学 摩擦学 纳米压痕 缩进 复合材料 分子动力学 之字形的 二硫化钨 法向力 雷亚克夫 刮伤 冶金 原子间势 化学 几何学 计算化学 数学 物理 机械
作者
Zihan Li,Yongda Yan,Yujie Xu,Yanquan Geng
出处
期刊:Tribology International [Elsevier]
卷期号:188: 108839-108839 被引量:2
标识
DOI:10.1016/j.triboint.2023.108839
摘要

Tungsten disulfide (WS2) has been assumed to have the excellent tribological property that has the potential to be used in the field of lubricating engineering. In this study, WS2 nanosheet was coated onto the surface of the copper to improve the wear resistance. The tribological properties of WS2 coated copper system were investigated by molecular dynamics (MD) simulation to understand the wear mechanisms from the nanoscale. The mechanical response of the bare and the WS2 coated copper in the indentation process were compared firstly. Then, scratching simulation tests were performed at the various indentation depths from 1.2 Å to 11.2 Å to understand the tribological mechanism from the elastic stage to the fracture stage. The effect of the nanoindentation depth and anisotropy orientation of WS2 on friction behavior were also analyzed during the scratching process. Results show that the load-bearing capacity and wear resistance of the copper substrate were improved by the WS2 coated layer before the fracture during the nanoindentation process, while the protection of the layer failed after rupture that the out-of-plane deformation induced the increase of the friction force. Additionally, the difference of the friction force could be induced by the lattice spacing of WS2 and the energy dissipation during ultralow friction stage. The crack propagation along the Zigzag direction dominated the fracture behavior in both Armchair and Zigzag orientation. This study provides important insights into the friction mechanism of the WS2 when conducting nanoscratching process.
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