Wafer Grinding of Using Fixed Abrasive Diamond Wheel - Evaluation of Cutting Edge Distribution in Diamond Wheels

The wafer grinding by use of fixed abrasive diamond wheels is required to create a high-quality wafer surface in a short time. In general, it is known that the grinding performance of diamond wheel is mainly dependent on grinding wheel specifications and grinding conditions. The cutting edge distribution or abrasive protrusion height in depth-wise of a specified wheel is one of the most important factors to determine the finishing surface roughness and the grinding force, which in turn determine the surface and subsurface quality of ground wafers. The overall purpose of this study is to understand the dynamic behavior of each diamond abrasive via modeling an actual diamond wheel and simulating of wafer grinding. In previous report [1], we have theoretically analyzed three-dimensional cutting edge distribution on the working surface of diamond wheels. This paper reports our recent achievements in the evaluation of 3-D cutting edge distribution in depth-wise of a specified wheel via the bearing ratio of its topography.