异质结
半导体
拉伤
材料科学
凝聚态物理
半导体材料
光电子学
物理
医学
内科学
作者
W. P. Gillin,D. J. Dunstan
出处
期刊:Physical review
[American Physical Society]
日期:1994-09-15
卷期号:50 (11): 7495-7498
被引量:45
标识
DOI:10.1103/physrevb.50.7495
摘要
It is often suggested that the rate of interdiffusion at semiconductor heterostructure interfaces may be strongly dependent on elastic strain in the structure. Experimental and theoretical results show that strain does not, and should not, affect interdiffusion.
科研通智能强力驱动
Strongly Powered by AbleSci AI