非阻塞I/O
材料科学
光电效应
光电子学
异质结
光电探测器
氧化物
图层(电子)
半导体
带隙
纳米技术
冶金
化学
生物化学
催化作用
作者
Dong‐Kyun Ban,Wang-Hee Park,Seong Wan Eun,Joondong Kim
出处
期刊:Journal of KIEEME
[The Korean Institute of Electrical and Electronic Material Engineers]
日期:2016-06-01
卷期号:29 (6): 359-364
标识
DOI:10.4313/jkem.2016.29.6.359
摘要
NiO serves as a window layer for Si photoelectric devices. Due to the wide energy bandgap of NiO, high optical transparency (over 80%) was achieved and applied for Si photoelectric devices. Due to the high the high mobility, the heterojunction device (Al/n-Si/$SiO_2$/p-NiO/ITO) provide ultimately fast photoresponses of rising time of $38.33{\mu}s$ and falling time of $39.25{\mu}s$, respectively. This functional NiO layer would provide benefits for high-performing photoelectric devices, including photodetectors and solar cells.
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