材料科学
薄膜
辐照
无定形固体
纳米晶材料
电介质
扫描电子显微镜
折射率
分析化学(期刊)
微晶
衰减系数
吸收(声学)
色散(光学)
熔融石英
光学
光电子学
复合材料
石英
结晶学
纳米技术
化学
核物理学
冶金
物理
色谱法
作者
Bassant Ebraheem,A.A.M. Farag,A. H. Ashour,N. Roushdy,M.M. El-Nahass
标识
DOI:10.1007/s10854-022-09776-4
摘要
Abstract Thermal evaporation was used to deposit In 2 Se 3 thin films with a thickness of 276 nm on different glass and quartz substrates under vacuum. The 60 Co rays were used to irradiate thin films at dosages of 10, 20, 30, 40, and 50) kGy. X-ray Diffraction (XRD) and scanning electron microscopy (SEM) were used to investigate the crystalline and morphological structure of In 2 Se 3 thin films, respectively. The results revealed that powder has a polycrystalline structure, whereas pristine and irradiated thin films are amorphous. The computed absorption coefficient indicates that direct transition is allowed for the as-deposited and γ-irradiated thin films, and the value of the measured energy gaps increases when the dose is increased from 10 to 50 kGy. Using single-oscillator models to obtain the dispersion parameters, the spectral dependency of the refractive index in the higher wavelength area was studied. The effect of irradiation on dielectric constants and dispersion characteristics suggests that the examined films are highly sensitive to appropriate irradiation dose. The nonlinear optical susceptibility has improved, making it appropriate for a variety of device applications.
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