The fabrication of anti-reflection grating structures film for solar cells using vibration-assisted UV nanoimprint lithography

To effectively improve the power conversion efficiency (PCE) of Si solar cells, vibration-assisted UV nanoimprint lithography based on piezoelectric driving is proposed to fabricate grating on Si solar cells. By applying piezoelectric vibration under the photoresist layer, vibration causes micro-displacement and micro-impact force, increasing the contact area between the photoresist and the grating's side wall and reducing surface tension. Meanwhile, the photoresist filling rate is increased by 25%. The effect of grating parameters on reflection is determined using Finite Difference Time Domain (FDTD), and grating with the best optical performance is optimized. In addition, the rationality of vibration introduction is verified by establishing a motion model, the influence of frequency and amplitude on the filling rate is analyzed using the finite element method, and a reasonable range of vibration parameters required by the experiment is obtained. Vibration-assisted UV nanoimprint is used to fabricate the periodic grating structures. PCE is increased by 25% when compared to bare Si solar cells. PCE of grating fabricated by vibration-assisted UV nanoimprint is increased by 4% when compared to traditional nanoimprint. The results show that vibration-assisted nanoimprint can efficiently and accurately fabricate periodic grating structures, resulting in improved Si solar cells performance.