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72 积分 2022-10-08 加入
Investigation of the impact of optical glass composition on ceria slurry stability during chemical mechanical polishing process
4天前
已完结
Dispersal mechanism of different dispersants and its effect on performance of 4H-SiC polishing slurry
4天前
已完结
A novel chemical mechanical polishing slurry for yttrium aluminum garnet crystal
4天前
已完结
Preparation of CeO2 Polishing Powder and Its Performance and Mechanism for Chemical Mechanical Polishing of Optical Glass
4天前
已完结
Observation of variations in polishing-induced contamination on optical glasses of different composition and chemical resistance
4天前
已完结
Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)
4天前
已完结
Atomic-scale insights into the material removal mechanism of cerium oxide polished fused silica based on ReaxFF-MD
12天前
已完结
Pressure-dependent material removal rate model of fluid jet polishing
12天前
已完结
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