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80 积分 2024-03-15 加入
Low-frequency dependence of plasma characteristics in dual-frequency capacitively coupled plasma sources
8小时前
已完结
Discharge mode and particle transport in radio frequency capacitively coupled Ar/O2 plasma discharges
10天前
已完结
Measurement of neutral gas temperature in inductively coupled Ar and Ar/O2 plasmas
10天前
已完结
Emission-line polarization degrees andnlmldistributions produced by state-selective electron capture in slow
2个月前
已完结
Noble gas effect on ACL etching selectivity to SiO2 films
2个月前
已完结
Atomic layer etching in HBr/He/Ar/O2 plasmas
2个月前
已完结
Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes
2个月前
已关闭
Atomic layer etching of GaN using Cl2 and He or Ar plasma
2个月前
已完结
Quasi‐atomic layer etching of silicon with surface chlorination and removal using Ar or He plasmas
2个月前
已完结
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