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80 积分 2024-03-15 加入
Numerical investigation of ion energy and angular distributions in a dc-biased H2 inductively coupled discharge
5天前
已关闭
Sheath thickness evaluation for collisionless or weakly collisional bounded plasmas
5天前
已完结
Analytical model for the radio-frequency sheath
5天前
已关闭
Consequences of low bias frequencies in inductively coupled plasmas on ion angular distributions for high aspect ratio plasma etching
7天前
已完结
Plasma sheath modelling to predict etch-induced overlay
12天前
已完结
Investigation of stochastic heating and its influence on plasma radial uniformity in biased inductively coupled Ar discharges by hybrid simulation
12天前
已完结
Kinetic simulations of low temperature plasmas used for plasma processing
12天前
已完结
Consequences of low bias frequencies in inductively coupled plasmas on ion angular distributions for high aspect ratio plasma etching
12天前
已完结
Improvement of photoresist etching by impedance control of a bias electrode in an inductive discharge
12天前
已完结
Ion motion above a biased wafer in a plasma etching reactor
12天前
已完结
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