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80 积分 2026-08-29 加入
Polyhydroxystyrene Carbonate Esters for High Sensitivity Photoresists Having Autodecomposition Temperatures > 160°
4天前
已完结
The synthesis, characterization, and deblocking of poly(4-tert-butoxystyrene) and poly(4-tert-butoxy-.alpha.-methylstyrene)
27天前
已完结
Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing
28天前
已完结
Structure effects of silicon-containing antireflection coatings
1个月前
已完结
Stable polysiloxane resins for silicon-containing anti-reflective coatings
1个月前
已完结