| 标题 |
Polyhydroxystyrene Carbonate Esters for High Sensitivity Photoresists Having Autodecomposition Temperatures > 160° |
| 网址 | |
| DOI |
10.1117/12.953048
doi
|
| 其它 |
期刊:Advanced Lithography 作者:W. Brunsvold; Willard E. Conley; Dale Murray Crockatt; N. Iwamoto 出版日期:1989-08-22 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人或该文件上传人下载。 |
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(2025-6-4)