Lv3
210 积分 2026-03-20 加入
Very low temperature (450 °C) selective epitaxial growth of heavilyin situboron-doped SiGe layers
7天前
已完结
A study of Boron Concentration Uniformity in Selective Epitaxial Growth for SiGe HBT
7天前
已完结
Numerical Modeling of Gas-Phase Nucleation and Particle Growth during Chemical Vapor Deposition of Silicon
14天前
已完结
Growth kinetic and doping of Si and SiGe epi layers on fullsheet substrates
24天前
已完结
Investigation of In Situ Boron‐Doping in SiGe Source/Drain Layer Growth for PMOS Devices
1个月前
已完结
B incorporation in Ge(001) grown by gas-source molecular-beam epitaxy from Ge2H6 and B2H6
1个月前
已完结
Effect of strain, substrate surface and growth rate on B-doping in selectively grown SiGe layers
1个月前
已完结
Investigation of Process Parameters on the Properties of Selective Epitaxial Growth SiGe Structure
1个月前
已完结
High boron incorporation in selective epitaxial growth of SiGe layers
1个月前
已完结
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