Lv12
98 积分 2025-06-30 加入
Dual-light-field regulated atomic surface for diamond polishing
1天前
已完结
Microscopic mechanisms of surface oxidation and material removal of polycrystalline diamond in photoelectro-Fenton reaction system
17天前
已完结
Study on photo-Fenton and ultrasonic synergistic enhanced abrasive jet polishing method for tungsten carbide alloy
20天前
已完结
Force-induced photocatalytic abrasive in-situ photochemical mechanical polishing 4H-SiC wafers
1个月前
已完结
Influence of preparation process on force-induced photocatalytic abrasive microstructure
1个月前
已完结
Fenton reaction-assisted chemical mechanical polishing of SiC wafer using gel disc with Al₂O₃‑SiO₂ core‑shell abrasives
2个月前
已完结
The effect of pH regulator on the surface quality of 4H-SiC wafers using ultraviolet-assisted chemical mechanical polishing
2个月前
已完结
Robust Hysteretic Observer-Based Optimal Control of Piezoelectric Nano-Motion Systems With Prescribed Performance
2个月前
已完结
A Novel Rate-Dependent Hysteresis Framework for Piezoelectric Actuators: Modeling, Identification, and Control
4个月前
已完结
Atomic level surface on aluminum alloy produced by novel environmentally-friendly photocatalytic chemical mechanical polishing with high material removal rate using hybrid ceria nanoabrasives
4个月前
已完结
皖公网安备34019202002308
