Lv1
80 积分 2025-10-24 加入
Fluid models calculation of Ar/CF4 radiofrequency capacitively coupled plasmas
4个月前
已完结
Research on Analytical Model of Synchronous Discharge of Capacitive Pulsed Power Supply
4个月前
已完结
Plasma Actuator Performance Driven by Dual-Power Supply Voltage—AC High Voltage Superimposed With Pulse Bias Voltage
4个月前
已关闭
Phosphorus‐Doped Polycrystalline Silicon via LPCVD: I . Process Characterization
4个月前
已完结
Mechanism of highly selective etching of SiCN by using NF3/Ar-based plasma
6个月前
已完结
First-Principles Prediction of Densities of Amorphous Materials: The Case of Amorphous Silicon
6个月前
已完结
Investigation of large-area multicoil inductively coupled plasma sources using three-dimensional fluid model
6个月前
已完结
Plasma and electrical characteristics of inductive discharge in a magnetic field
6个月前
已完结
The Effect of Various Coil Parameters on Inductive Coupling Plasma Reactor Simulation Using COMSOL
6个月前
已完结
The ion kinetics at the wafer edge by the variation of geometry and permittivity of the focus ring in capacitively coupled discharges
6个月前
已完结
皖公网安备34019202002308
