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Surface roughness and material removal mechanism in rotating abrasive jet polishing of internal surface
3个月前
已完结
Material removal mechanism in chemical mechanical polishing: theory and modeling
3个月前
已完结
Magnetic liquid metal-assisted abrasive flow polishing for uniform complex surfaces
3个月前
已完结
Study on the preparation and polishing performance of novel elastic magnetic abrasives with spherical core-shell structure
3个月前
已完结
Polymer Nanoparticles Applied in the CMP (Chemical Mechanical Polishing) Process of Chip Wafers for Defect Improvement and Polishing Removal Rate Response
6个月前
已完结
Prediction of CMP Material Removal Rate based on Pad Surface Roughness Using Deep Neural Network
7个月前
已关闭
Research on Process Parameters Intellectual Decision Support System for High Efficiency and Precision CMP Function Ceramics
7个月前
已完结
Deep pattern solution for interpreting systematic defects
7个月前
已关闭
Advanced Semiconductor Manufacturing Using Big Data
8个月前
已完结
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