Lv35
298 积分 2026-06-16 加入
Simulation-guided AI-driven digital twin for plasma etching in semiconductor fabrication
3天前
已完结
Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas
1个月前
已完结
Active area patterning for CFET: nanosheet etch
1个月前
已完结
Towards accurate and efficient process simulations based on atomistic and neural network approaches
2个月前
已完结
Attention Is All You Need
2个月前
已关闭
Multiscale Lattice-Boltzmann Finite Difference Model for Thermal Conduction from Nanoscale Hot Spots
2个月前
已关闭
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