Lv5
1014 积分 2023-03-07 加入
Atomic layer etching of high-k oxide thin films using hexafluoroacetylacetone and oxygen radicals
11小时前
待确认
Disrupting the DRAM roadmap with capacitor-less IGZO-DRAM technology
3个月前
已完结
Approach to reducing oversaturated boron content in plate poly layer of DRAM
5个月前
已完结
Improvement in dielectric properties of ZrO2 thin film by employing a Zr precursor with enhanced thermal stability in high-temperature atomic layer deposition
6个月前
已完结
Effect of increasing deposition temperature of atomic-layer–deposited ZrO2 thin films: improvement of leakage-current properties
6个月前
已完结
Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor
7个月前
已完结
Atomic Layer Deposition of ZrO2 Films at High Temperatures (>350 °C) Using a Modified Cyclopentadienyl Zr Precursor
7个月前
已完结
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