Lv6
2520 积分 2023-11-19 加入
Improvement of gate oxide breakdown through STI structure Modification in DRAM
2天前
已完结
Effects of Plasma Damage Removal on Direct Contact Resistance and Hot-Electron-Induced Punch Through (HEIP) of PMOSFETs
9天前
已关闭
Analysis of DRAM Standby Current Failure due to Hot Electron Induced Punch-through (HEIP) of PMOS transistor
9天前
已关闭
Study of Lanthanum Diffusion in HfO2-Based High-k Gate Stack
11天前
已完结
Lanthanum Interaction with Surface Preparations
11天前
已完结
Applicable Solvent Photoresist Strip Process for High-K/Metal Gate
11天前
已完结
CMOS Scaling and Issues in Sub0.25 m Systems
19天前
已完结
The leakage current improvement in an ultrashallow junction NMOS with Co silicided source and drain
20天前
已完结
Improvement of gate oxide breakdown through STI structure Modification in DRAM
1个月前
已完结
(Invited) Si-Cap-Free Low-DIT SiGe Gate Stack for High-Performance pFETs
1个月前
已完结
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