Lv6
2950 积分 2023-11-19 加入
Interfacial Reaction of TiN/HfSiON Gate Stack in High-Temperature Annealing for Gate-First Metal–Oxide–Semiconductor Field-Effect Transistors
1个月前
已完结
Thermal Degradation of HfSiON Dielectrics Caused by TiN Gate Electrodes and Its Impact on Electrical Properties
1个月前
已完结
Interfacial Reaction of TiN/HfSiON Gate Stack in High-Temperature Annealing for Gate-First Metal–Oxide–Semiconductor Field-Effect Transistors
1个月前
已完结
Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
1个月前
已关闭
Broadband Unidirectional Thermal Emission Enhancement of Phase‐Gradient Metasurface Based on Surface Plasmon Polaritons
2个月前
已完结
Accurate determination of flat band voltage in advanced MOS structure
2个月前
已完结
Improvement of gate oxide breakdown through STI structure Modification in DRAM
3个月前
已完结
Effects of Plasma Damage Removal on Direct Contact Resistance and Hot-Electron-Induced Punch Through (HEIP) of PMOSFETs
3个月前
已关闭
Analysis of DRAM Standby Current Failure due to Hot Electron Induced Punch-through (HEIP) of PMOS transistor
3个月前
已关闭
Study of Lanthanum Diffusion in HfO2-Based High-k Gate Stack
3个月前
已完结
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