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30 积分 2026-08-07 加入
ZEP520A — A resist for electron-beam grayscale lithography and thermal reflow
18天前
已完结
The Chemical Recovery of PMMA into Monomer
21天前
已完结
Making digital twins using the Deep Learning Kit (DLK)
1个月前
已完结
Physics-based dry metal–oxide–resist simulations
1个月前
已完结
Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)
1个月前
已完结
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