Lv61
1820 积分 2022-08-12 加入
Influence of oxygen flow on the structure, chemical composition, and dielectric strength of AlxTayOz thin films deposited by pulsed-DC reactive magnetron sputtering
14天前
已完结
Convergence during feedback controlled reactive magnetron sputtering: Mechanisms and classification
14天前
已完结
Linking erosion and sputter performance of a rotatable Mo target to microstructure and properties of the deposited thin films
18天前
已完结
In-situ detection method for wafer movement and micro-arc discharge around a wafer in plasma etching process using electrostatic chuck wafer stage with built-in acoustic emission sensor
20天前
已关闭
High-NA EUV lithography: pushing the limits
2个月前
已完结
Dielectric phenomena in solids : with emphasis on physical concepts of electronic processes
4个月前
已完结
Thermal and Electrical Analysis of the Electrostatic Chuck for the Etch Equipment
4个月前
已完结
Temperature of a Semiconducting Substrate Exposed to an Inductively Coupled Plasma
4个月前
已完结
Unintended gas breakdowns in narrow gaps of advanced plasma sources for semiconductor fabrication industry
5个月前
已完结