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70 积分 2025-09-05 加入
Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas
6天前
已完结
Printed Nb2O5 Metasurfaces for Ultraviolet-Visible Chiro-Optical Holography
3个月前
已完结
All‐Glass Nanohole Metalens by Non‐Diffracting Laser Lithography
5个月前
已完结
Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas
6个月前
已完结
Recent Advances in Plasma Etching for Micro and Nano Fabrications of Silicon-based Materials: A Review
6个月前
已完结