Lv11
78 积分 2025-09-05 加入
Etching of high aspect ratio structures in Si using SF6/O2 plasma
12天前
已完结
Mass transfer analysis of a concentration-regulated metal-assisted chemical etching system and its application in Si nanohole fabrication
12天前
已完结
Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas
4个月前
已完结
Printed Nb2O5 Metasurfaces for Ultraviolet-Visible Chiro-Optical Holography
8个月前
已完结
All‐Glass Nanohole Metalens by Non‐Diffracting Laser Lithography
10个月前
已完结
Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas
11个月前
已完结
Recent Advances in Plasma Etching for Micro and Nano Fabrications of Silicon-based Materials: A Review
11个月前
已完结
皖公网安备34019202002308
