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High aspect ratio silicon etch: A review
9个月前
已完结
Faster, Smaller, Deeper: the Challenges of High Aspect Ratio Etching
9个月前
已完结
Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings
11个月前
已完结
Plasma Erosion Behavior of Yttrium Oxide film formed by Aerosol deposition Method
11个月前
已完结
Microstructure and plasma corrosion behavior of yttria coatings prepared by the aerosol deposition method
11个月前
已完结
Plasma-Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process
11个月前
已完结
Fluid Simulation of the Plasma Characteristics in an Inductively Coupled Plasma Source with Planar and Cylindrical Coils
1年前
已完结
Plasma resistant glass (PRG) for reducing particulate contamination during plasma etching in semiconductor manufacturing: A review
1年前
已完结
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