Lv1
100 积分 2024-05-20 加入
Breaking stochastic tradeoffs with a dry deposited and dry developed EUV photoresist system
5天前
已关闭
Area-Selective Deposition of AlOx and Al-Silicate for Fully Self-Aligned Via Integration
25天前
已完结
Dry Cleaning Technology for Removal of Silicon Native Oxide Employing Hot NH3/NF3Exposure
1个月前
已完结
Improving SiO2 to SiNx etch selectivity during atomic layer etching with multiple selective organic pre-functionalization steps
1个月前
已完结
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3
1个月前
已完结
Atomic layer deposition of SnO2 thin films using tin(IV) acetate as a novel precursor
1个月前
已关闭
Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma
1个月前
已完结
Area-selective atomic layer deposition of Al2O3 on SiNx with SiO2 as the nongrowth surface
2个月前
已完结
Effects of Diethoxymethylsilane/Helium Flow Rate Ratio on Low-k Films Deposited by Plasma-Enhanced Chemical Vapor Deposition
2个月前
已完结
Hierarchical Nb@NbN core-shell-like nanocolumns for asymmetric supercapacitors
3个月前
已完结
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