| 标题 |
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3 |
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| DOI | |
| 其它 |
期刊:Journal of vacuum science & technology 作者:Nobuya Miyoshi; Hiroyuki Kobayashi; Kazunori Shinoda; Masaru Kurihara; Kohei Kawamura; et al 出版日期:2021-12-20 |
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(2025-6-4)