Lv2
118 积分 2025-04-24 加入
Improved properties of atomic layer deposited ruthenium via postdeposition annealing
11小时前
待确认
Thermal atomic layer etching of SnO2 by fluorination and ligand-exchange/conversion reactions using sequential hydrogen fluoride and Al(CH3)3 exposures
2个月前
已关闭
Thermal atomic layer deposition of molybdenum carbide films using bis(ethylbenzene)molybdenum and H2
2个月前
已完结
Size-Dependent Resistivity in Nanoscale Interconnects
3个月前
已完结
Future interconnect materials for highly integrated semiconductor devices
3个月前
已完结
SiO2 atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation
3个月前
已关闭
SiO2 atomic-layer fluorination-passivation for dual-material molybdenum/polypyrrole area-selective deposition and strategies for surface reactivation
3个月前
已关闭
Growth dynamics in patterned TiO2 deposited by direct atomic layer processing (DALP) in ambient conditions
3个月前
已关闭
Magnesium salt decomposition and morphological development during evaporative decomposition of solutions
4个月前
已完结
Deposition of molybdenum thin films by an alternate supply of MoCl5 and Zn
4个月前
已完结
皖公网安备34019202002308
