Lv42
501 积分 2021-05-13 加入
Sub‐10‐nm Lithography for Sn4–Oxo Clusters: Effect of Molecular Polarity on Sensitivity and Resolution
10小时前
已完结
Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films
4天前
已完结
X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
4天前
已完结
Influence of Chemical Structures on E-Beam Lithography Performance of Polysilsesquioxanes
4天前
已完结
In Situ Analysis of Electron-Induced Chemical Transformations in Vapor-Phase-Synthesized Al-Based InorganicOrganic Hybrid Thin Films for EUV Resist Platform
4天前
已完结
Nanoscale molecular analysis of photoresist films with massive cluster secondary-ion mass spectrometry
4天前
已完结
Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry
4天前
已完结
Photoresist film analysis to investigate LWR generation mechanism
4天前
已完结
Examining the Molecular Composition of Sub-10-nm Domains With Nano-Projectile Secondary Ion Mass Spectrometry
4天前
已完结
Formation of deprotected fuzzy blobs in chemically amplified resists
4天前
已完结
Immigrant Incorporation in East Asian Democracies
皖公网安备34019202002308
