Lv41
607 积分 2021-05-13 加入
Phenolic molecular glasses as resists for next-generation lithography
18天前
已完结
The nondestructive testing research on porcelain-fused-to-metal (PFM) of oral cavity
18天前
已完结
Surface electron emission lithography system based on a planar type Si nanowire array ballistic electron source
18天前
已完结
Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation
18天前
已完结
Metal organic cluster photoresists: new metal oxide systems
18天前
已完结
Development of metal organic cluster EUV photoresists
18天前
已完结
Polymer sequence alters sensitivity and resolution in chemically-amplified polypeptoid photoresists
18天前
已关闭
Benefits of three-dimensional mask (M3D) effects in high-NA and hyper-NA EUV lithography
18天前
已完结
Differentiable forward modeling and inverse lithography for two-photon lithography: application to voxel-by-voxel, diffractive optical element, and spatial light modulator systems
18天前
已完结
Prediction of overlay deviation caused by reticle heating during EUV exposure
18天前
已完结
Immigrant Incorporation in East Asian Democracies
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