Lv4
500 积分 2022-04-12 加入
Highly effective removal of OH bonds in low-temperature silicon oxide films by annealing with ammonia gas at a low temperature of 175 °C
5天前
已完结
Enhancement of removing OH bonds from low-temperature-deposited silicon oxide films by adding water vapor into NH3 gas annealing at 130 °C
5天前
已完结
Reoxidation after NH3 Plasma Nitridation for Multiple-Thickness Oxynitrides
5天前
已完结
Oxidation rate and surface-potential variations of silicon during plasma oxidation
5天前
已完结
A review of the plasma oxidation of silicon and its applications
5天前
已完结
Water diffusion in silica film during silicon wet oxidation
22天前
已完结
On the thermal re-oxidation of silicon oxynitride
1个月前
已完结
Oxynitride gate dielectric grown in nitric oxide (NO): the effect of reoxidation on dielectric reliability of the active edge
1个月前
已完结
Role of near-surface states in ohmic-Schottky conversion of Au contacts to ZnO
1个月前
已完结
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