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442 积分 2023-10-09 加入
Stochastic effects in EUV lithography: random, local CD variability, and printing failures
1天前
待确认
Critical dimension control using ultrashort laser for improving wafer critical dimension uniformity
1天前
已完结
Multiscale simulations for exploring photo-chemical processes to mitigate the critical dimension variability of contact holes in EUV lithography
1天前
已完结
Contact local CD uniformity optimization through etch shrink
1天前
已完结
Improvement in photomask critical dimension uniformity using etch selectivity control
1天前
已完结
EUV single exposure via patterning at aggressive pitch
1天前
已完结
Extreme contact shrink for back end of line connectivity
1天前
待确认
Assessment of pattern variability and defectivity by large-scale SEM metrology with >100 million measurements
1天前
已完结
Extreme contact shrink for back end of line connectivity
1天前
已关闭
New approach of local critical dimension uniformity improvement for via/contact hole etch with direct current superposition
2天前
已完结
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