Lv11
10 积分 2025-12-21 加入
Large Language Model-Driven Knowledge Graph Construction for Photoresist Materials
21分钟前
已完结
A Lithographer’s Guide to Patterning CMOS Devices with Directed Self-Assembly
2个月前
已完结
Chemical trimming overcoat: an advanced spin-on process for photoresist enhancement in EUV lithography
6个月前
已完结
Accelerating polymer self-consistent field simulation and inverse DSA-lithography with deep neural networks
10个月前
已完结
Rectification of extreme ultraviolet lithography patterns by directed self-assembly: a roughness and defectivity study
10个月前
已完结
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