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Precise and practical 3D topography simulation of high aspect ratio contact hole etch by using model optimization algorithm
1年前
已完结
Process optimization for shallow trench isolation etch using computational models
1年前
已完结
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. II. Experiments and model validation
1年前
已关闭
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. I. Modeling framework and simulation
1年前
已关闭
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