Lv1
48 积分 2025-03-25 加入
Synthesis of polymers with a norbornane backbone by radical copolymerization of alkyl 2-norbornene-2-carboxylates for photoresist applications
1个月前
已完结
New ArF Photoresist Based on Modified Maleic Anhydride Cycloolefin Polymers
1个月前
已完结
Physical model-based ArF photoresist formulation development
1个月前
已完结
Molecular feature influence on ArF photoresist polymer dissolution behavior
2个月前
已完结
Synthesis of ArF photoresist polymers via continuous-flow RAFT polymerization with an efficient strategy for their thiocarbonylthio end group removal
2个月前
已关闭
Development of new resist materials for 193-nm dry and immersion lithography
2个月前
已完结
Hydrophobic Surface Construction by Phase-Separation of Fluorinated Block Copolymer for Immersion Lithography
2个月前
已完结
Synthesis of Fluorinated Materials for 193-nm Immersion Lithography and 157-nm Lithography
2个月前
已关闭
Integration of block copolymer directed assembly with 193 immersion lithography
2个月前
已完结
Synthesis of Polystyrene-block-poly(3-hydroxy-1-methacryloyloxyadamantane) (PS-b-PHAdMA) via RAFT polymerization as candidate block copolymers for next generation lithography
2个月前
已完结
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