Lv1
8 积分 2025-03-25 加入
Development of new resist materials for 193-nm dry and immersion lithography
6小时前
已完结
Hydrophobic Surface Construction by Phase-Separation of Fluorinated Block Copolymer for Immersion Lithography
6小时前
待确认
Synthesis of Fluorinated Materials for 193-nm Immersion Lithography and 157-nm Lithography
6小时前
已关闭
Integration of block copolymer directed assembly with 193 immersion lithography
6小时前
已完结
Synthesis of Polystyrene-block-poly(3-hydroxy-1-methacryloyloxyadamantane) (PS-b-PHAdMA) via RAFT polymerization as candidate block copolymers for next generation lithography
6小时前
已完结
Aqueous Developable and CO2‐Sourced Chemical Amplification Photoresist with High Performance
1个月前
已完结
A Step Toward Cationic RAFT Polymerization of Less Reactive Monomers: Dithiobenzoates Bearing Electron-Withdrawing Groups as a Chain-Transfer Agents
1个月前
已完结
Synthesis of branched and benzyl chlorine-free poly(4-acetoxystyrene) via living polymerization followed by Friedel–Crafts alkylation
1个月前
已完结
Enhanced Lithographic Performance of Polymer-Bound PAG Photoresists Synthesized via RAFT Polymerization
3个月前
已完结
Sensitive photoresists for high-speed two-photon lithography
3个月前
已完结
皖公网安备34019202002308
