| 标题 |
Integration of block copolymer directed assembly with 193 immersion lithography |
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| 其它 |
期刊:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 作者:Chi-Chun Liu; Paul F. Nealey; Alex K. Raub; Philip J. Hakeem; Steve R. J. Brueck; et al 出版日期:2010 |
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(2025-6-4)