Lv3
316 积分 2025-04-03 加入
Pulsed CVD of Tungsten Thin Film as a Nucleation Layer for Tungsten Plug-Fill
1个月前
已完结
Effect of Nucleation-Stage Reducing Agents on Residual Stress in CVD Tungsten Thin Films
1个月前
已完结
Enhanced mechanical properties and biocompatibility on BC/HAp composite through calcium gluconate fortified bacterial
1个月前
已完结
Cobalt interconnect integration: progress in metal deposition, chemical mechanical polishing, and post-CMP cleaning for advanced technology nodes
3个月前
已完结
Kinetic analysis and steric-hindrance effects in thermal atomic layer deposition of high-purity cobalt films with dicobalt hexacarbonyl tert-butylacetylene as the precursor
3个月前
已关闭
Pulsed chemical vapor deposition of cobalt and cobalt carbide thin films
3个月前
已完结
Area-selective atomic layer deposition (AS-ALD) of low temperature (300 °C) cobalt thin film using octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs)
3个月前
已完结
Process and characteristics of cobalt films deposited by thermal atomic layer deposition and silicide film formed
4个月前
已完结
?The Degradation of Deposition Blocking Layer during Area Selective Plasma Enhanced Atomic Layer Deposition of Cobalt
4个月前
已完结
Atomic Layer Deposition of Cobalt Film from Dicobalt-hexacarbonyl-tert-butylacetylene and Hydrogen
4个月前
已完结
皖公网安备34019202002308
