Lv21
150 积分 2025-04-03 加入
Impact of chemical bonding difference of ALD Mo on SiO2 and Al2O3 on the effective work function of the two gate stacks
5小时前
已完结
High-performance imido–amido precursor for the atomic layer deposition of Ta2O5
6个月前
已完结
Atomic Layer Deposition of Copper Metal Films from Cu(acac)2 and Hydroquinone Reductant
7个月前
已完结
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